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United States Patent 3,459,152 August 5, 1969 Apparatus For Epitaxially Producing A Layer On A Substrate Lilburn H. Garrison William E. Winter Filed August 28, 1964 |
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Abstract of the DisclosureApparatus for growing epitaxial layers of semiconductor material on a single crystal substrate includes a means for connecting each substrate into a separate electrical circuit. Each circuit includes a means for monitoring the current flowing in the circuit. The power supplied to the electrical circuit is constantly adjusted automatically in response to the current sensing means thereby preventing the substrate and its epitaxial growth from exceeding a predetermined maximum temperature and keeping the substrate within a predetermined temperature range. |
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Citations [54]:1,601,931 10/1926 Arkel 3,058,812 10/1962 Chu 2,854,318 09/1958 Rummel 3,117,859 01/1964 Chandrasekhar 3,011,877 12/1961 Schweickert 3,145,447 08/1964 Rummel, et al 3,030,189 04/1962 Schweickert 3,146,123 08/1964 Bischoff 3,042,493 07/1962 Reuschel 3,147,141 09/1964 Ishizuka |