United States Patent 3,481,781
December 2, 1969

Silicate Glass Coating Of Semiconductor Devices
Werner Kearn

Filed March 17, 1967
Image of US PATENT 3,481,781

Abstract of the Disclosure

A silicate glass coating is synthesized by chemical vapor phase reaction on the surface of an object by heating the object to a temperature in the range of 300 C. to 600 C. in an atmosphere consisting of a mixture of an inert carrier gas, silane (SiH4) as a source of silicon for silicon dioxide, other hydrides and/or alkyls as sources of ions for secondary oxides, and oxygen. For example, a borosilicate glass consisting of a mixture of silicon dioxide (SiO2) and boron trioxide (B2O3) is synthesized from silane and diborane (B2H6), by oxidation of these hydrides at elevated temperature.
Figure descriptions: cover graphic

  • a typical apparatus suitable for carrying out the present method.

 Citations [54]:
3,019,137 01/1962 Hawlet 3,330,694 07/1967 Black 3,117,832 01/1964 Sterling 3,396,052 08/1968 Rand 3,228,812 01/1966 Blake 3,306,768 02/1967 Peterson
National Museum of American History
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