PATENT COVER GRAPHIC


United States Patent 3,481,781
December 2, 1969

Silicate Glass Coating Of Semiconductor Devices
Werner Kearn

Filed March 17, 1967
Image of US PATENT 3,481,781

Abstract of the Disclosure

A silicate glass coating is synthesized by chemical vapor phase reaction on the surface of an object by heating the object to a temperature in the range of 300 C. to 600 C. in an atmosphere consisting of a mixture of an inert carrier gas, silane (SiH4) as a source of silicon for silicon dioxide, other hydrides and/or alkyls as sources of ions for secondary oxides, and oxygen. For example, a borosilicate glass consisting of a mixture of silicon dioxide (SiO2) and boron trioxide (B2O3) is synthesized from silane and diborane (B2H6), by oxidation of these hydrides at elevated temperature.
Figure descriptions: cover graphic

  • a typical apparatus suitable for carrying out the present method.

 Citations [54]:
  
3,019,137 01/1962 Hawlet 3,330,694 07/1967 Black 3,117,832 01/1964 Sterling 3,396,052 08/1968 Rand 3,228,812 01/1966 Blake 3,306,768 02/1967 Peterson
National Museum of American History
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