PATENT COVER GRAPHIC


United States Patent 3,484,311
December 16, 1969

Silicon Deposition Process
Walter C. Benzing

Filed June 21, 1966
Image of US PATENT 3,484,311

Abstract of the Disclosure

Process for forming a continuous coating of silicon upon an inert substrate by contacting the substrate with a mixture of silane and hydrogen at an elevated temperature thereby depositing polycrystalline silicon on the substrate and thereafter contacting the substrate with a head decomposable silicon halide to continue the growth of polycrystalline silicon.
Figure descriptions: cover graphic

  • Figure 1 is a schematic elevational view of one apparatus suitable for use in practicing the process of this invention.
  • Figure 2 is a schematic elevational view in cross section of one application of the coatings produced by the process of this invention.

 Citations [54]:
  
3,165,811 01/1965 Kleimack 3,173,814 03/1965 Law 3,177,100 04/1965 Mayer 3,332,137 07/1967 Kenny 3,393,349 07/1968 Huffman
National Museum of American History
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