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United States Patent 3,549,433
December 22, 1970

Method Of Purifying Etched Silicon Surfaces
Theodor Renner
Ludwig Mogele


Filed July 2, 1968
Image of US PATENT 3,549,433

Abstract of the Disclosure

The present invention relates generally to a method of purifying the surfaces of etched silicon bodies prior to the subsequent application and indiffusion of dopants. Primarily, it relates to the removal of chemical groups present in the etching solution, which have occupied the surface valences of the silicon, freed during etching. These chemical groups, which cannot be completely removed either by rinsing with water or heating, are removed by contacting with an aqueous iodine/potassium iodide solution.
Figure descriptions: no drawings


 Citations [54]:
  
3,436,284 04/1969 Klein
National Museum of American History
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