United States Patent 3,461,836
August 19, 1969

Epitactic Vapor Coating Apparatus
Heinz Henker

Filed December 28, 1965
Image of US PATENT 3,461,836

Abstract of the Disclosure

Described is apparatus for the simultaneous precipitation of crystalline semiconductor layers upon a plurality of disc-like crystalline substrates which are arranged in a reaction vessel on the surface of an elongated and heatable carrier which extends in a horizontal direction. A gas inlet tube with a row of openings at its lower side and rotatable about its horizontal axis is provided above the carrier and parallel to it. A gas outlet tube similar to the gas inlet tube and also provided with a row of openings, is situated below the carrier and also extends parallel to the carrier. Also described is the method of using the above apparatus.
Figure descriptions: cover graphic

  • Figure 1 is a sectional view of part of an apparatus for performing the method of the invention.
  • Figure 2 is a cross section of the apparatus.
  • Figure 3 shows a lateral elevation.
  • Figure 4 is a view seen from the right of Figure 3 and also shows schematically a reciprocating drive for one of the gas-inlet nozzle tubes of the apparatus.

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2,576,289 11/1951 Fink 3,304,908 02/1967 Gutsche 2,887,088 05/1959 Nack 3,233,578 02/1969 Capita 3,206,325 09/1965 Auerbach 3,314,393 04/1967 Haneta 3,206,326 09/1965 Whaley 3,381,114 04/1968 Nakamuri 3,208,888 02/1969 Zeigler
National Museum of American History
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