United States Patent 3,485,666
December 23, 1969

Method Of Forming A Silicon Nitride Coating
Henry Frank Sterling
Charles George Swann

Filed May 3, 1965
Image of US PATENT 3,485,666

Abstract of the Disclosure

This is a method of depositing a coherent solid layer of silicon nitride deposited upon a surface of a substrate by establishing an electrodeless glow discharge adjacent to said surface in an atmosphere containing a gaseous hydride of silicon and a gaseous hydride of nitrogen.
Figure descriptions: cover graphic

  • Figure 1 shows apparatus for producing silicon and other layers.
  • Figure 2 shows apparatus for producing silica and other layers.

 Citations [54]:
National Museum of American History
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