United States Patent 4,552,833
November 12, 1985

Radiation Sensitive and Oxygen Plasma Developable Resist
Hiroshi Ito
Scott A. MacDonald
Roberd D. Miller
Carlton G. Willson

Filed May 14, 1984
Image of US PATENT 4,552,833

Abstract of the Disclosure

A negative tone resist emage is achieved by (1) coating a substrate with a film of a polymer containing a masked, reactive functionality; (2) imagewise exposing the film to radiation in a fashion such that the masked functionality is liberated; (3) contacting the film with an organimetallic reagent; (4) developing the relief image by the oxygen plasma etching
Figure descriptions: no drawings

 Citations [54]:
4,307,177 12/1981 Crivello 4,307,178 12/1981 Kaplan et al. 4,389,482 06/1983 Bargon et al. 4,396,704 08/1983 Taylor 4,464,455 08/1984 Yoneda et al. 4,481,049 11/1984 Reichmanis et al. 4,481,279 11/1984 Naito et al. 5,517,276 05/1985 Lewis
National Museum of American History
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