PATENT COVER GRAPHIC

United States Patent 4,552,833
November 12, 1985

Radiation Sensitive and Oxygen Plasma Developable Resist
Hiroshi Ito
Scott A. MacDonald
Roberd D. Miller
Carlton G. Willson

Filed May 14, 1984
Image of US PATENT 4,552,833

Abstract of the Disclosure

A negative tone resist emage is achieved by (1) coating a substrate with a film of a polymer containing a masked, reactive functionality; (2) imagewise exposing the film to radiation in a fashion such that the masked functionality is liberated; (3) contacting the film with an organimetallic reagent; (4) developing the relief image by the oxygen plasma etching
Figure descriptions: no drawings 


 Citations [54]:
  
4,307,177  12/1981  Crivello
4,307,178  12/1981  Kaplan et al.
4,389,482  06/1983  Bargon et al.
4,396,704  08/1983  Taylor
4,464,455  08/1984  Yoneda et al.
4,481,049  11/1984  Reichmanis et al.
4,481,279  11/1984  Naito et al.
5,517,276  05/1985  Lewis
National Museum of American History
HomeSearchChip TalkChip FunPatentsPeoplePicturesCreditsCopyrightComments